ULVAC DA-121DE隔膜真空泵可议价
ULVAC DA-121DE隔膜真空泵可议价
ULVAC DA-121DE隔膜真空泵可议价
ULVAC DA-121DE隔膜真空泵产品特性
ULVAC DA-121DE隔膜真空泵应用领域
ULVAC DA-121DE隔膜真空泵技术规格
ULVAC DA-121DE隔膜真空泵性能参数
ULVAC DA-121DE 隔膜真空泵相关信息
ULVAC DA-121DE 一、基本性能参数
极限压力:3300(pa)
抽气速率:7200(l/s),换算后50赫兹下120升/分钟、60赫兹下145升/分钟
功率:0.4(kw)
电压:有100V、115V、200V、220V等规格,如1φ100V(50/60Hz)
重量:26(kg)
外形尺寸:193.5411285
排出口径:G1/2(mm)
ULVAC DA-121DE 二、工作原理与结构特点
原理:隔膜泵,是利用薄橡胶膜(隔膜)的往复运动进行真空排气的真空泵。
结构特点
构造简单:维保方便,易于维护。
无油环境设计:气体接触区域不使用油,属于干式真空泵,可避免油污染,适用于对清洁度要求较高的工作环境,如半导体和电子器件制造设备相关的真空排气系统(刻蚀设备、去胶设备、离子清洗设备等)、真空热处理炉真空排气系统(烧结炉、渗碳炉等)、锂电池制造设备真空排气系统(电极干燥设备、脱泡设备、注液设备等)。
ULVAC DA-121DE 三、应用领域
半导体和电子器件制造:在刻蚀设备、去胶设备、离子清洗设备等真空排气系统中有应用,这些设备在半导体芯片制造过程中对真空环境要求严格,DA-121DE隔膜真空泵能满足其需求,保障生产过程顺利进行。
真空热处理:例如在烧结炉、渗碳炉等真空热处理炉的真空排气系统中发挥作用,确保炉内达到所需的真空度,有助于提高热处理的质量和效果。
锂电池制造:可应用于电极干燥设备、脱泡设备、注液设备等锂电池制造设备的真空排气系统,为锂电池生产过程提供稳定的真空环境,有助于提高锂电池的性能和质量。
ULVAC DA-121DE diaphragm vacuum pump related information
1. Basic performance parameters
Ultimate pressure: 3300(pa)
Pumping rate: 7200 (l/s), converted to 120 liters/minute at 50 Hz and 145 liters/minute at 60 Hz
Power: 0.4(kw)
Voltage: 100V, 115V, 200V, 220V and other specifications, such as 1φ100V (50/60Hz)
Weight: 26(kg)
Overall dimensions: 193.5411285
Discharge diameter: G1/2(mm)
2. Working principle and structural characteristics
Principle: Diaphragm pump is a vacuum pump that uses the reciprocating motion of a thin rubber membrane (diaphragm) to exhaust vacuum.
Structural features
Simple structure: convenient and easy to maintain.
Oil-free environment design: No oil is used in the gas contact area. It is a dry vacuum pump, which can avoid oil pollution. It is suitable for working environments with high requirements for cleanliness, such as vacuum exhaust systems (etching) related to semiconductor and electronic device manufacturing equipment. equipment, degumming equipment, ion cleaning equipment, etc.), vacuum heat treatment furnace vacuum exhaust system (sintering furnace, carburizing furnace, etc.), lithium battery manufacturing equipment vacuum exhaust system (electrode drying equipment, deaeration equipment, liquid injection equipment, etc. ).
3. Application fields
Semiconductor and electronic device manufacturing: It is used in vacuum exhaust systems such as etching equipment, glue removal equipment, and ion cleaning equipment. These equipments have strict vacuum environment requirements during the semiconductor chip manufacturing process. The DA-121DE diaphragm vacuum pump can meet their needs. , to ensure the smooth progress of the production process.
Vacuum heat treatment: For example, it plays a role in the vacuum exhaust system of vacuum heat treatment furnaces such as sintering furnaces and carburizing furnaces to ensure that the required vacuum degree is achieved in the furnace, which helps to improve the quality and effect of heat treatment.
Lithium battery manufacturing: It can be applied to the vacuum exhaust system of lithium battery manufacturing equipment such as electrode drying equipment, deaeration equipment, and liquid injection equipment to provide a stable vacuum environment for the lithium battery production process and help improve the performance and quality of lithium batteries. .
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